In Lab on Tuesday 1/22/2013 half of the students did boron channel-stop implants under the future Field Oxide regions of our nMOSFET wafers. Here you see the 150mm wafer end station (the 100 mm end station is off to the right). The source enclosure is in the back of the two students and one of the control racks is on the left.

This picture shows Joshua and Matt setting up the beam.

Here we see them adjusting the current display and setting up the "M" shape of the properly focused and trimmed beam.

The resist was stripped off using our hot solvent strip and the wafers were put through the Standard Clean process (see below). Don't worry there was another student in protective gear backing up Matt. Josh was just observing.

We then set up the Bruce oxidation furnace recipe for the Field Oxide (FOX) growth. We used recipe #xxx. The recipe details are listed on the RIT MyCourses website. You have to be registered for the course to access those details or email Dr. Pearson.

A view of 4 of the furnace tubes.